Diffusion bonding of ceramicsRelationship between processing parameters for diffusion bonding
Diffusion bonding is a solid state process relying on atomic migration across an interface. The bond is formed during the application of temperature and pressure over a period of time. The two surfaces to be joined require a good surface finish (Ra <0.4µm) and must be clean. As a general rule, diffusion bonding is undertaken at a temperature of 80% of the melting point of the material. If dissimilar materials are used then 80% of the lowest melting point material is used. The technique can be applied to a wide range of materials including metals, ceramics and combinations thereof. In many instances direct bonding is not possible due to thermal expansion mismatch or metallurgical incompatibility. It is then that an interlayer or combination of interlayers is used. An interlayer thickness of a few microns is commonly used and this can be pre-placed as a thin foil interlayer or by sputter coating. In addition, TWI can offer the following facilities:
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